Fig. 6From: Microstructural evolution of tantalum nitride thin films synthesized by inductively coupled plasma sputteringCross-sectional (X) TEM analysis of TaNx film grown with 0.15 fN2 for 100 W ICP power. (a) BF TEM image with corresponding SADP in the inset. DF TEM images of (c) δ- TaN (111), (d) δ- TaN (200), and (e) ε- TaN \( \left(11\overline{2}1\right) \) reflections in TaNx filmBack to article page