Fig. 3From: Evaluation of ion/electron beam induced deposition for electrical connection using a modern focused ion beam systemHR-TEM images for (a) W-IBID, (b) Pt-IBID, and (c) C-IBID at 30 kV; (d) W-EBID, (e) Pt-EBID, and (f) C-EBID at 5 kV; and (g) W-EBID, (h) Pt-EBID, and (i) C-EBID at 1 kVBack to article page