Fig. 1From: Method of Ga removal from a specimen on a microelectromechanical system-based chip for in-situ transmission electron microscopySchematic of the two different methods of Ar+ ion milling to remove Ga+ ions. a Performing Ar+ ion milling the lamella while leaving it inside the trench, b Performing Ar+ ion milling after taking the lamella out of the trench and attacing it to the lift-out gridBack to article page