Fig. 5From: Microstructural evolution of tantalum nitride thin films synthesized by inductively coupled plasma sputteringPTEM images of TaNx film grown with 0.15 fN2 for 100 W ICP power. (a) BF TEM image, (b) SADP and its indexing, (c, d) Dark-field (DF) TEM images of δ - TaN (111), and ε- TaN \( \left(11\overline{2}1\right) \) reflections in TaNx filmBack to article page